basic function

To meet the etching requirements of thin film solar cells on rigid glass substrate surfaces, four devices are used to correspond to the etching needs of different functional layers of different thin film cells.P1 uses nanosecond infrared to etch TCO, P2 uses picosecond ultraviolet or green light to etch the functional layer, P3 uses picosecond ultraviolet or green light to etch the back electrode, and P4 uses high-power nanosecond infrared for edge cleaning.

Special note: In the development of the flexible substrate pilot line Yuanlu Optoelectronics, please feel free to contact us by phone for detailed consultation!

High production capacityCan be equipped with multiple beam processing (can be equipped with a single channel), with a single machine production capacity of up to100MW;

High precision: Adopting high precisionCCD positioning, positioning accuracy ± 15um;

High ReliablityAdopting a unique structure, the equipment has high stability;

Strong adaptabilityEach device can be used both offline (with a connecting station added before and after) and online to meet the needs of different customers;

performance parameter