MPI RF calibration substrate-Fornitore globale

Product Groups

Nano observer electrical atomic force microscope
EM-AFM electron microscope in situ atomic force microscope
SERS chip substrate
Maskless laser direct writing
Semi automatic wafer bonding machine
proximity aligner
Array pressure sensing system
Atomic layer deposition system ALD products
Electron microscope sample cleaning machine
CMP20 electrochemical mechanical polishing machine
Laser interference lithography machine
VITA reactive ion etching machine (vertical chamber)
COWIN High Throughput Integrated Plasma Reaction Ion Etching Cleaning System
LAVIDA Paraxylene Coating Equipment
Co series desktop plasma etching machine cleaning machine
CLONE dual-mode plasma etching machine cleaning machine
Liquid particle size analyzer
EzAFM portable atomic force microscope
Laser sampling
Precision glass cutting machine (desktop type)
ADR low-temperature constant temperature dry mK system
Liquid Particle Sizer - LPC
High temperature 3D printer
Block resistance tester
S100 type digital source table
NX12 Biological Atomic Force Microscope
Zeta-388 automatic multi-mode optical profilometer
TS200-HP high-power probe station
Zeta-300 multi-mode optical profilometer
TS2000-DP high-power probe station
TS50 manual small probe station
TS2500-RF Fully Automatic RF Probe Station
TS3000 automatic probe station
MicroXAM800 White Light Interferometer
TS300 12 inch manual probe station
MDO34 oscilloscope
In situ AFM in SEM
Pulse laser deposition system (PLD)
Active Vibration Isolation Platform AMT
Duramin-100 hardness tester
3-inch nanoimprint machine NIL75
In situ automatic nanomanipulation system
In situ MEMS chips and synchrotron radiation holders
In SEM HT high-temperature in-situ nanoindentation instrument
Duramin-4 hardness tester
High temperature in-situ nanoindentation instrument
Active isolation table ARISTT
Active isolation table ARISMD
Passive vibration isolation SOTOT
Passive isolation table GWA-M
Passive isolation table GWA-TO
Active isolation table PMT
Diener Pico plasma cleaning machine
Diener FEMTO plasma cleaning machine
FT-NMT04 Nano Mechanical Performance Testing System
ACCUTOM-10/-100 cutting equipment
X1 series digital adjustable drying cabinet
EZ series stereomicroscope
DM 4500P semi-automatic intelligent digital polarizing microscope
Leica M Series Stereoscopic Microscope LeicaM165FC/205FA
S series stereomicroscope
Leica M Series Stereoscopic Microscope LeicaM125/165C/205C/205A
DM750P professional polarizing microscope
EUV/X-ray reflector
X-ray Fresnel zone plate (FZP)
Grating template
MPI Titan RF Accessories
GGB microwave probe
Quantifoil porous mesh carrier
GGB calibration standard sample
Customized vibration isolation system
Ion beam etching/deposition system
Silicon nitride thin film window
AFM substrate
AFM probe
MPI RF calibration substrate
GGB active high impedance needle tip
GGB DC probe
Hole shaped template
Prism coupler
Duramin-40 hardness tester
4-inch nanoimprint machine NIL-100
Leica room temperature ultra-thin slicer Leica EM UC7
Film thickness measuring instrument
BI-2500 desktop surface plasmon resonance analyzer
Established Active Vibration Isolation Platform
BI-4500 high-throughput fully automatic surface plasmon resonance analyzer
TS150-HP high-power probe station
Scanwave Scanning Microwave Near Field Impedance Microscope
MVI scattering scanning near-field optical microscope
TS150 6-inch manual probe station
4200A-SCS parameter analyzer
F40 Microscopic Film Thickness Measuring Instrument
Zeta20 multi-mode 3D optical profilometer

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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China

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MPI RF calibration substrate

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MPI QAlibria ®-RF calibration software

MPIRF calibration substrate

The AC series calibration substrate provides up to 26 sets of standards for LRM probe tip calibration of wafer level SOLT, GS/SG, and GSG probes.

Five coplanar lines provide broadband reference for diverse TRL calibration and accuracy verification of conventional methods.

Add right angle equivalent components, support SOLR calibration of the system, and configure the right angle of the RF probe. Calibration substrates for wide spacing probes can also be used.

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