High temperature anaerobic oven-Global supplier

Product Groups

Firm Information

Transaction Level

VIP member
Contact
Phone

13560710910
Address

No. 6255 Longgang Avenue, Yihe Industrial Park, Henggang Street, Longgang District, Shenzhen City

Contact Now

High temperature anaerobic oven

A high-performance anaerobic oven can perform heat treatment at temperatures up to 500 ℃ in an atmosphere with oxygen concentrations as low as 500ppm.

Contact Supplier

More Products

Product details

1、 Equipment Overview

A high-performance anaerobic oven can perform heat treatment at temperatures up to 500 ℃ in an atmosphere with oxygen concentrations as low as 500ppm. This makes the series very suitable for MLCC and LTCC degreasing, as well as various antioxidant heat treatments. The high-temperature anaerobic oven adopts a proprietary chamber structure and sealing technology, which has excellent airtightness and temperature uniformity, while also ensuring higher stability and reproducibility. Simultaneously using an external cooling mechanism with circulating cooling water can achieve rapid cooling without affecting the atmosphere inside the furnace, thereby shortening the processing time.

Scope of Application

Suitable for curing semiconductor wafers (photoresist PI, PBO curing), IC packaging (copper substrate, silver paste, silicone, epoxy resin), glass substrate baking, high-precision annealing treatment, etc.

Application scope	Heating purpose	Heating object
Electronic components	Defatting (adhesive sintering), curing	Ceramic materials/plates, MLCC (multi-layer ceramic capacitors), LTCC (low-temperature co fired ceramics), ceramic O2 sensor, ferrite core, FPC (flexible printed circuit), common mode noise filter, thermistor
Precision raw materials	Degreasing, curing, annealing, sintering, drying	Wafer, silicon wafer, silicon carbide ceramic, electrostatic suction cup, aluminum nitride, optical lens, flexible substrate, rechargeable battery, electrode material, wire harness (copper wire), catalyst, forged product

3、 Product parameters

model	YH-OXY-500C	Stable range of work	Room temperature -500 ℃
Ultimate oxygen content	Within 50PPM	Cooling method	Water cooling and cooling
Size
Working Size	H600W600D600mm
Studio
Number of studios	A single studio, which can be divided into 4 levels
internal configuration	Configure 4 stainless steel support shelves, wrapped with stainless steel mesh plates, and adjustable shelf spacing
Air transport heating system
heating rate	Heating rate 8-10 ℃/min, controllable constant temperature time
cooling rate	Cool down from 500 ℃ to 100 ℃ for ≤ 50 minutes (the time may vary depending on the temperature of the cooling water)
Nitrogen filling device	Automatically control the nitrogen filling process to ensure that the product is heated in an anaerobic or low oxygen concentration environment, preventing oxidation of the product
Electrical appliances
Over temperature protection device	Independent intelligent temperature controller, when the actual detected temperature exceeds the set value of the over temperature protector, automatically cuts off the heating power supply, providing dual protection
Protection system	The equipment has phase loss detection, self diagnosis, leakage protection, over temperature protection, automatic parameter saving in case of emergencies, sensor self diagnosis, overload protection, grounding protection, fan overheating protection, battery access control, and operator error prevention setting protection
Usage environment	Environmental conditions: Temperature between 5-40 ℃: Humidity ≤ 85% R.H 电源： AC380V，50HZ Usage environment: No strong vibration, no strong magnetic field influence, no corrosive gas, no dust. Air pressure 86~106Ka Nitrogen source: 0.8MPA, 100L/MIN Wall distance ≥ 500mm

Online inquiry

Contacts
Company
Telephone
Email
WeChat
Verification Code
Message Content