Shanghai Nateng Instrument Co., Ltd
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Film thickness measuring instrument
Film thickness measuring instrument
Product details

KLA's Filmetrics series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range from nm to mm. It can achieve accurate measurement of film thickness for materials such as photoresist, oxides, silicon or other semiconductor films, organic films, conductive transparent films, etc. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has multiple products including F10-HC, F20, F32, F40, F50, F60-t, etc. It can measure samples ranging from a few millimeters to 450mm in size, with a film thickness measurement range of 1nm to mm. Filmetrics F10-RT is designed for vacuum coating, and reflection and transmission spectra can be obtained with just a click of the mouse. No need to spend time changing hardware configuration, F10-RT-UV can simultaneously collect reflection and transmission spectra with just a click of the mouse. In less than a second, the array spectrometer can quickly collect data. In addition, Filmetrics' dedicated Autobaseline design can reduce the parameter reading time for benchmark calibration by more than ten times. For only a small fraction of the traditional price, users can conduct minimum/maximum analysis, determine FWHM, and perform color analysis. The optional thickness and refractive index modules allow you to fully utilize the analytical capabilities of Filmetrics F10. The measurement results can be quickly exported and printed.

1major function

lMain applications

Simultaneous measurement of reflectivity and transmittance of thin films

Color analysis of spatial color system

Multi layer thin film analysis capability

Film thickness and parameter calculation module

lTechnical Capability

Spectral wavelength range: 380-1050 nm

Thickness measurement range: 15nm-70 μ m

Minimum thickness for measuring n&k: 100 nm

Accuracy: Take the larger value, 2nm or 0.4%

Accuracy: 0.1nm

Stability: 0.07nm

Spot size: 6mm

IIapplication

Semiconductor manufacturing: photoresist, oxide, nitride

LCD display: LCD gap, polyimide protective film, nano indium tin metal oxide

Biomedical components: polymer/poly (p-xylene) coating, biofilm/bubble ball thickness, drug coated stent

Micro electromechanical systems: silicon film, aluminum nitride/zinc oxide thin film filters

Optical coating: hard coating, anti reflective coating, Filters filter


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