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FilmetricsMeasurement of Thin Film ResistanceThe device originated from havingexceed30KLA's Years of ExperienceThin film resistance measurement technology, developed by 20yearFilmetrics with experience in developing desktop measuring equipmentThe team has improvedDesktop block resistance measurement product.KLA thin film resistance measurementTechnologies include contact (4PP) and non-contact (EC) methods.
Filmetrics R50seriesblockResistance measuring instruments can measure conductive sheets and films deposited on various substrates,Across 10 orders of magnitude rangeresistivity, including:
Semiconductor wafer substrate
glass substrate
Plastic (flexible) substrate
PCBPattern features
solar cell
Flat panel display layer and patterned features
metallic foil
2、 Main functions
ltechnologyspecifications
Model |
Description |
R50-4PP |
Four probe testing automaticXYmobile station-100mm*100mm Can be directly implemented100mmWafer block resistormappingmeasure Can be placed with a diameter200mmPrototype Wafer |
R50-EC |
Non contact eddy current testing automaticXYmobile station-100mm*100mm Can be directly implemented100mmWafer block resistormappingnon-contactmeasure Can be placed with a diameter200mmPrototype Wafer |
R50-200-4PP |
Four probe testing automaticXYmobile station-200mm*200mm Can be directly implemented200mmWafer block resistormappingmeasure |
R50-200-EC |
Non contact eddy current testing automaticXYmobile station-200mm*200mm Can be directly implemented200mmWafer block resistormappingnon-contactmeasure |
3、 Application
Support a wide range of measurements, including but not limited to the following:
Metal film thickness, substrate thickness, sheet resistance, resistivity, conductivity, multilayer film
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