1. Product Introduction
The anaerobic clean tunnel furnace can maintain a cleanliness level of 100 in an atmosphere with an oxygen concentration as low as 100 ppm, with a maximum heating temperature of 300 ℃, and achieve multi temperature zone baking of products. Very suitable for precision component wafers, crystal oscillator annealing, epoxy resin curing and other heat treatments. The continuous production mode can be linked with the automation equipment of the front and rear processes to achieve automated production.

2. Product Features
●Compact structure and small footprint
●It is an ideal choice for small-scale production of multiple product types
●The box is welded with full argon arc welding to ensure continuous sealing of the box
●Automatic nitrogen charging system
●Equipped with HEPA high-temperature resistant and high-efficiency filters to create a dust-free environment
●The exterior adopts a double box structure with baked paint
●Touch screen integrated control

3. Optional features
●Paperless recorder
●485 communication or Ethernet communication
●Oxygen content analyzer

4. Product parameters