Nanoimprint technology has broken through the difficulties of traditional lithography in reducing feature size, and has the characteristics of high resolution, low cost, and high yield. sinceSince its proposal in 1995, nanoimprinting has undergone 14 years of development, evolving into various imprinting techniques widely used in semiconductor manufacturing mems、 Biochips, biomedicine, and other fields are known as one of the top ten technologies that have changed humanity.
NIL embossing machineThe basic idea is to transfer the graphics onto the corresponding substrate through a template, and the transfer medium is usually a thin polymer film. The structure is hardened by methods such as hot pressing or irradiation to preserve the transferred graphics. The entire process includes two steps: embossing and graphic transfer. According to different imprinting methods,NIL can be mainly divided into three photolithography techniques: hot embedding, UV curing, and micro contact printing (uCP).

II function

lmajor function

The main function of a nanoimprint machine is to transfer the pattern onto the corresponding substrate. The transfer medium is usually a thin polymer film, which is hardened through methods such as hot pressing or irradiation to preserve the transferred pattern. Embossing technology is mainly divided into the following two types:

Hot pressing:Firstly, apply a thin layer of thermoplastic polymer material (such asPMMA）。 Raise the temperature and reach above the glass transition temperature Tg (glass transition temperature) of this thermoplastic material. Under high elasticity, thermoplastic materials are pressed onto a nanoscale mold and subjected to appropriate pressure. The thermoplastic material fills the cavity in the mold, and after the molding process is completed, the temperature decreases to solidify the thermoplastic material, resulting in a pattern that overlaps with the mold. Subsequently, remove the mold and perform various etching processes to remove residual polymers. Next, we will proceed with the graphic transfer. Graphic transfer can be achieved through etching or stripping methods. Etching technology uses thermoplastic materials as masks to perform anisotropic etching on the underlying substrate, resulting in corresponding patterns. The peeling process first deposits a layer of metal on the surface, and then dissolves the polymer with organic solvents. As a result, the metal on the thermoplastic material will also be peeled off, leaving the metal as a mask on the substrate. Then, etching is performed to obtain the pattern.

UV imprint:In order to improve the disadvantage of thermal deformation in hot stamping, the University of TexasC. G. Wilson and S v. Sreenivasan has developed Step Flash Imprint Lithography, which uses UV transparent quartz glass (hard mold) or PDMS (soft mold), and a low viscosity, light cured monomer solution for photoresist. First, drop a low viscosity monomer solution onto the substrate to be imprinted. Combined with microelectronics technology, the deposition of the thin film can be achieved by using a spin coating method. The template is pressed onto the wafer with very low pressure to disperse the liquid and fill the cavities in the template. UV exposure through the mold promotes polymerization and solidification of the polymer in the imprinting area. Finally, etch the residual layer and perform pattern transfer to obtain a high aspect ratio structure. The final demolding and graphic transfer process is similar to the hot pressing process.

Technical features

The host includes: vacuum system, temperature control system, pressure control system, water cooling system, PLCControl

Manufacturing system, software interface, UV light source, single-sided electromagnetic heating system

Maximum imprint size of equipment:4 Inches.

The device can achieve hot stamping and ultraviolet exposure stamping

★Maximum pressure:8bar(Air compressor),20bar(External cleanroom air source)

Temperature range: from room temperature to 250 centigrade.

UV light source type: High pressure mercury lamp: Power:400WMain wavelength:365nm.

★Equipment vacuum degree:10 Pa.

★The equipment can provide a full range of nanoimprint adhesives according to scientific research needs, including:

Hot press adhesive, UV cured adhesive

Deep etching imprint adhesive, Lift Off type）Imprint adhesive

Quick template making materials, various template anti sticking agents, substrate thickening agents, etc

★Random with the device, customized nanoimprint templates can be provided according to scientific research needs, including: period400nmof4Inch dot matrix template nickel templateSFP ® & Hybrid Mold ®Soft Template

branchhold20nmResolution and surface imprinting, and provide literature process support,

★Support automatic demolding and electromagnetic heating function

Greater than domestic and international 10 A customer

The process includes:

Nanoimprint adhesive spin coating process support

Nanoimprint template anti sticking process support to avoid the influence of demolding adhesive

Parameter adjustment of nanoimprint machine

Soft template process, including PDMSTemplateSFPAndHybrid Moldworkmanship

ICPEtching process

Flexible polymer substrate imprinting process, Nickel TemplateMetal nickel template hot pressingPET、PMMAWait, wait

Lift off）Process support, processing metal structures

Nanoimprint characterization technology

Update stamping process research and development guidance, literature support

Technical Capability

The inventor of this device was Stephen Y., the inventor of nanoimprint technology at Princeton University in the United States, from 2001 to 2003 Professor Chou's nanostructure laboratory, as a research assistant, conducted a 3-year research work and developed UV curable nanoimprint technology and materials, making important contributions to the development of nanoimprint technology. After joining the Department of Materials Science and Engineering in 2004, he continued to conduct research on nanomicrofabrication technology and nanoimprint technology, developed several new nanoimprint materials, developed new polymer imprint templates, and proposed curved nanoimprint technologyRice embossing technology; utilizeWith the support of the 863 project "Development and Application of Dual purpose Nanoimprint Equipment for UV Curing and Hot Pressing", a dual-purpose nanoimprint equipment with UV curing and hot pressing functions has been successfully developed. It has become a product and has been adopted by many universities and research institutions such as Nanjing University, Beihang University, University of National Defense Technology, Heilongjiang University, and Shenzhen Research Institute of the Chinese Academy of Sciences, forming a core nanoimprint technology with independent intellectual property rights. It has applied for and obtained multiple applications for China specific and US specific applications, and its technical level is synchronized with the most advanced international level in this field.